Octafluorocyclobutane, C4F8 Specialty Gas

CAS NO	115-25-3
UN NO	1976
EINECS NO	204-075-2
Molecular weight	200.03
Appearance	Colorless, Odorless
Melting point	-41.4 ℃
Boiling point	-6 ℃
Density	6.9 kg/m³
DOT Class	2.2
Label	Non-flammable Gas

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Octafluorocyclobutane is a chemical substance, a perfluorinated derivative of cyclobutane, colorless, odorless and stable.

Octafluorocyclobutane is obtained by dimerization of tetrafluoroethylene and reductive coupling of 1,2-dichloro-1,1,2,2-tetrafluoroethane.

Octafluorocyclobutane is used as deposition gas and etchant in the production of semiconductor materials and devices. It is also being studied as a refrigerant in special applications as an alternative to ozone depleting chlorofluorocarbon refrigerants. Taking advantage of its volatility and chemical inertness, octafluorocyclobutane may be present in some aerosolized foods. C4F8 was investigated as a possible replacement for sulfur hexafluoride as a dielectric gas.

C4F8 Gas Application

Food packaging gas

A food additive, which is a (usually inert) gas used to encapsulate food during packaging, thereby protecting C4F8 Gas from unwanted chemical reactions during subsequent transport and storage, such as food spoilage or oxidation. The term includes propellant gas used to expel food from a container.

Food propellant

C4F8 Gas Propellant used to expel food from aerosol containers.

In addition, C4F8 is used for plasma etching in the semiconductor industry. In the RF field, C4F8 produces reactive species that selectively etch silicon. During etching, C4F8 plasma radicals can form protective polymers that prevent chemical attack on features and can provide sidewall protection.

We offer Octafluorocyclobutane gas in various purities and concentrations. For more information on purchasing C4F8 Gases, see the table below and download the Spec Sheet and Safety Data Sheet.

Etching or cleaning gas in semiconductor production processes

Food aerosol propellant, medium gas

99.999% C4F8, Electronic Grade

Specification	99.999%
Oxygen + Argon	≤ 1 ppm
Nitrogen	≤ 2 ppm
Hydrogen	≤ 0.5 ppm
Carbon Monoxide	≤ 0.5 ppm
Carbon Dioxide	≤ 0.5 ppm
Methane	≤ 0.5 ppm
OHC	≤ 2 ppm
Moisture	≤ 3 ppm
Acidity as HF	≤ 0.1 ppm