Teflon is a cryogenic refrigerant that is relatively inert under normal conditions, an oxygen displacer, and is also used in various wafer etching processes.
Tetrafluoromethane, also known as carbon tetrafluoride or R-14, is the simplest perfluorocarbon ( CF4 ). As its IUPAC name suggests, tetrafluoromethane is the perfluorinated counterpart of hydrocarbon methane. It can also be classified as haloalkane or halomethane. Tetrafluoromethane is a useful refrigerant, but also a potent greenhouse gas. It has a very high bond strength due to the nature of the carbon-fluorine bond.
Tetrafluoromethane is sometimes used as a cryogenic refrigerant (R-14). It can be used alone for electronic microfabrication or in combination with oxygen as a plasma etchant for silicon, silicon dioxide and silicon nitride. It is also used in neutron detectors.
Plasma etching process for various integrated circuits
Low temperature refrigerant
99.999% CF4, Electronic Grade
|Oxygen + Argon||≤ 1 ppm|
|Nitrogen||≤ 2 ppm|
|Hydrogen||≤ 0.3 ppm|
|Carbon Monoxide||≤ 0.3 ppm|
|Carbon Dioxide||≤ 0.3 ppm|
|Sulfur Hexafluoride||≤ 0.3 ppm|
|THC||≤ 0.3 ppm|
|Trifluoromethane||≤ 0.3 ppm|
|OFC||≤ 1 ppm|
|Moisture||≤ 1 ppm|
|Acidity as HF||≤ 0.1 ppm|
*Other Grades and Purity Available on Asking
*Other Packages Available on Asking
More than fifteen years on the market.
ISO certificate manufacturer & Stable raw material source.
On-line analysis system for gas quality control in every step, highly close to 100% pass rate.
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